Szczegóły publikacji

Opis bibliograficzny

Toward ultraflat surface morphologies during focused electron beam induced nanosynthesis: disruption origins and compensation / Robert Winkler, Aleksandra SZKUDLAREK, Jason D. Fowlkes, Philip D. Rack, Ivo Utke, Harald Plank // ACS Applied Materials & Interfaces ; ISSN 1944-8244. — 2015 — vol. 7 iss. 5, s. 3289–3297. — Aleksandra Szkudlarek – dod. afiliacja: EMPA Swiss Federal Laboratories for Mechanics of Materials and Nanostructures, Thun, Switzerland

Autorzy (6)

Słowa kluczowe

platinumpatterningfocused electron beam induced depositionmorphology

Dane bibliometryczne

ID BaDAP95312
Data dodania do BaDAP2016-01-15
DOI10.1021/am508052k
Rok publikacji2015
Typ publikacjiartykuł w czasopiśmie
Otwarty dostęptak
Czasopismo/seriaACS Applied Materials & Interfaces

Abstract

Emerging applications for nanoscale materials demand precise deposit shape retention from design to deposition. This study investigates the effects that disrupt high-fidelity shapes during focused electron beam induced nanosynthesis. It is shown that process parameters, patterning strategies and deposit topography can impose lateral precursor coverage gradients during growth resulting in unwanted topographic artifacts. The study classifies the evolving surface shapes into four general types and explains the formation and transition from a fundamental point of view. Continuum model calculations and simulations expand the experimental results to provide a comprehensive insight into understand the disruption mechanism. The findings demonstrate that the well-established concept of growth regimes has to be expanded by its lateral gradients as they strongly influence final shape fidelities. Finally, the study is complemented by a compensation strategy that improves the edge fidelity on the lower nanoscale to further push this technique toward the intrinsic limitations.

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