Szczegóły publikacji
Opis bibliograficzny
The nanoscale implications of a molecular gas beam during electron beam induced deposition / Robert Winkler, Jason Fowlkes, Aleksandra Szkudlarek, Ivo Utke, Philip D. Rack, Harald Plank // ACS Applied Materials & Interfaces ; ISSN 1944-8244. — 2014 — vol. 6 iss. 4, s. 2987–2995. — Bibliogr. s. 2994–2995, Abstr. — Publikacja dostępna online od: 2014-02-06. — A. Szkudlarek - afiliacja: EMPA, Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland
Autorzy (6)
- Winkler Robert
- Fowlkes Jason P.
- Szkudlarek Aleksandra
- Utke Ivo
- Rack Philip D.
- Plank Harald
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 150010 |
|---|---|
| Data dodania do BaDAP | 2023-12-20 |
| Tekst źródłowy | URL |
| DOI | 10.1021/am405591d |
| Rok publikacji | 2014 |
| Typ publikacji | artykuł w czasopiśmie |
| Otwarty dostęp |  |
| Czasopismo/seria | ACS Applied Materials & Interfaces |
Abstract
The gas flux direction in focused electron beam induced processes can strongly destabilize the morphology on the nanometer scale. We demonstrate how pattern parameters such as position relative to the gas nozzle, axial rotation, scanning direction, and patterning sequence result in different growth modes for identical structures. This is mainly caused by nanoscale geometric shadowing, particularly when shadowing distances are comparable to surface diffusion lengths of (CH3)3-Pt-CpCH3 adsorbates. Furthermore, two different adsorbate replenishment mechanisms exist and are governed by either surface diffusion or directional gas flux adsorption. The experimental study is complemented by calculations and dynamic growth simulations which successfully emulate the observed morphology instabilities and support the proposed growth model.
