Szczegóły publikacji
Opis bibliograficzny
Optical and structural properties of amorphous silicon-carbon films for optoelectronic applications / T. STAPIŃSKI, B. SWATOWSKA, S. KLUSKA, E. WALASEK // Applied Surface Science ; ISSN 0169-4332. — Tytuł poprz.: Applications of Surface Science. — 2004 — vol. 238 iss. 1–4, s. 367–374. — Bibliogr. s. 373–374, Abstr. — Publikacja dostępna online od: 2004-08-18. — APHYS-2003 : 1st international neeting on Applied Physics : Badajoz, Spain, October 15-18, 2003
Autorzy (4)
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 21194 |
|---|---|
| Data dodania do BaDAP | 2005-03-25 |
| Tekst źródłowy | URL |
| DOI | 10.1016/j.apsusc.2004.05.177 |
| Rok publikacji | 2004 |
| Typ publikacji | referat w czasopiśmie |
| Otwarty dostęp |  |
| Czasopismo/seria | Applied Surface Science |
Abstract
The authors developed the RF plasma enhanced chemical vapour deposition method for preparation of a-Si:C:H films of potential optoelectronic properties. The films were obtained on glass and (001) Si in optimised technological parameters such as content of gaseous mixture of SiH4, and CH4, gas pressure, temperature and RF power density. The surface morphology, chemical composition, optical properties, chemical bonding structure, were investigated. The film structure and composition depended on process parameters and configuration. The results of optical investigations show that these materials are characterised by variable optical gap dependent on carbon content. In chosen conditions it is possible to produce material of optimal optical properties for solar application as antireflective and protective coatings for solar cells. (C) 2004 Published by Elsevier B.V.
