Szczegóły publikacji
Opis bibliograficzny
Optimization of gold thin films by DC magnetron sputtering: structure, morphology, and conductivity / Wojciech BULOWSKI, Katarzyna SKIBIŃSKA, Piotr ŻABIŃSKI, Marek WOJNICKI // Coatings [Dokument elektroniczny]. — Czasopismo elektroniczne ; ISSN 2079-6412 . — 2025 — vol. 15 iss. 11 art. no. 1240, s. 1–18. — Wymagania systemowe: Adobe Reader. — Bibliogr. s. 16–18, Abstr. — Publikacja dostępna online od: 2025-10-24. — W. Bulowski - dod. afiliacja: CBRTP SA Research and Development Center of Technology for Industry, Warszawa, Poland
Autorzy (4)
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 163996 |
|---|---|
| Data dodania do BaDAP | 2025-11-14 |
| Tekst źródłowy | URL |
| DOI | 10.3390/coatings15111240 |
| Rok publikacji | 2025 |
| Typ publikacji | artykuł w czasopiśmie |
| Otwarty dostęp |  |
| Creative Commons | |
| Czasopismo/seria | Coatings |
Abstract
Gold thin films were deposited on quartz substrates by DC magnetron sputtering to fabricate electrodes for electrochemical and resistive sensing applications. The influence of sputtering parameters on film thickness, structure, and electrical properties was systematically investigated. XRD analysis revealed a predominant (111) crystallographic orientation. Microstrain values, determined via Williamson–Hall (W–H) analysis, were low (below 0.013) and closely correlated with surface roughness trends. AFM measurements showed that the surface roughness increased with film thickness. Electrical resistivity decreased linearly with increasing thickness and exhibited a critical grain size of approximately 25 nm, beyond which conductivity improved markedly. These results demonstrate the strong dependence of Au thin-film morphology and performance on deposition conditions, offering practical guidelines for optimizing their application in functional sensing devices.
