Szczegóły publikacji
Opis bibliograficzny
Investigation of the topography of magnetron-deposited Cu/Ni multilayers by X-ray reflectometry and atomic force microscopy / Barbara Kucharska, Edyta Kulej, Jarosław KANAK // Optica Applicata ; ISSN 0078-5466 . — 2009 — vol. 39 no. 4, s. 881–888. — Bibliogr. s. 887–888
Autorzy (3)
- Kucharska Barbara
- Kulej Edyta
- AGHKanak Jarosław
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 50803 |
|---|---|
| Data dodania do BaDAP | 2010-03-04 |
| Tekst źródłowy | URL |
| Rok publikacji | 2009 |
| Typ publikacji | artykuł w czasopiśmie |
| Otwarty dostęp |  |
| Czasopismo/seria | Optica Applicata |
Abstract
This paper presents the results of research of Cu/Ni multilayers magnetron-deposited on an Si (100) substrate. The thickness of Cu sublayers was identical in all multilayers and equaled 2 nm. The thickness of Ni sublayers varied between 1.2 and 3.0 nm. The surface topography of the multilayers was examined using the AFM (research of different areas). The interface roughness and period thickness were characterized by X-ray reflectometry (XRR). The roughness of the multilayers achieved by the XRR method was very similar for all 0.6 nm samples examined. However, the values of the roughness parameter R a obtained by AFM examination were in the range of 0.09-0.32 nm, and depended on the size of the area examined. Based on the function obtained from the AFM measurements, taken on surface areas varying in size, an area of 1.5-4.0 cm2 was determined, for which an agreement between the roughness parameter, as determined by the AFM method, and the XRR method results would be expected.
