Szczegóły publikacji
Opis bibliograficzny
Effect of deposition geometry on structural, electrical and optical properties of $ZnO:Al$ films by magnetron sputtering / Halina CZTERNASTEK // Vacuum : Surface Engineering, Surface Instrumentation & Vacuum Technology ; ISSN 0042-207X. — 2008 — vol. 82 iss. 10 spec. iss., s. 994–997. — Bibliogr. s. 997, Abstr. — Publikacja dostępna online od: 2008-01-17. — Proceedings of the 9th Electron technology conference ELTE 2007 : Cracow, 4–7 September 2007 / guest eds. Tadeusz Pisarkiewicz, Barbara Dziurdzia. — [Dorchester] : Elsevier, 2008. — Zastosowano procedurę peer review
Autor
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 39373 |
|---|---|
| Data dodania do BaDAP | 2008-06-24 |
| Tekst źródłowy | URL |
| DOI | 10.1016/j.vacuum.2008.01.036 |
| Rok publikacji | 2008 |
| Typ publikacji | referat w czasopiśmie |
| Otwarty dostęp |  |
| Czasopismo/seria | Vacuum |
Abstract
Al-doped ZnO films were prepared by the dc magnetron sputtering technique on Suprasil-1 substrates at a temperature of 470 K. Plasma-emission monitoring was used to stabilize oxygen flow to the deposition chamber. The effect of substrate position during deposition on the structural, electrical and optical properties of the films was investigated. It was found that preparation of low-resistance films with high optical transmission over the visible region is possible under condition of low plasma effects on the growing film. (C) 2008 Elsevier Ltd. All rights reserved.
