Szczegóły publikacji
Opis bibliograficzny
Recrystallization texture formation in $Cu-3.9Si$ alloy / W. RATUSZEK, A. BUNSCH, K. CHRUŚCIEL // W: Applied crystallography : proceedings of the XVIII conference : Wisła, Poland, 4–7 September 2000 / eds. Henryk Morawiec, Danuta Stróż. — Singapore [etc.] : World Scientific, 2001. — ISBN: 981-02-4613-7. — S. 259–262. — Bibliogr. s. 262
Autorzy (3)
Dane bibliometryczne
| ID BaDAP | 28810 |
|---|---|
| Data dodania do BaDAP | 2006-09-19 |
| DOI | 10.1142/9789812811325_0039 |
| Rok publikacji | 2001 |
| Typ publikacji | materiały konferencyjne (aut.) |
| Otwarty dostęp |  |
Abstract
Deformation and recrystallization textures and their mutual relation were studied in Cu-3.9Si alloy. It was found that, the texture after deformation is of the same type as in Cu-0.33-1.10P, Cu-2.4-6.5Al and Cu-Si alloy with lower silicon content but the course of recrystallization texture formation is different. Three separate steps of the recrystallization texture formation were found on the subsequent annealing stages. At first the deformation texture is transformed into almost random texture, then the fibre texture is formed and finally this fibre is decomposed into separated texture components. All texture changes occurring during recrystallization are discussed on the base of preferred nucleation and oriented growth theory [1].
