Szczegóły publikacji
Opis bibliograficzny
Structural analysis of $Sr_{n+1}Ru_{n}O_{3n+1}$ thin films deposited by laser ablation — Analiza struktury cienkich warstw $Sr_{n+1}Ru_{n}O_{3n+1}$ otrzymanych techniką ablacji laserowej / R. CHMIELOWSKI, V. Madigou, M. A. Frémy, M. BLICHARSKI, G. Nihoul // Archives of Metallurgy and Materials / Polish Academy of Sciences. Committee of Metallurgy. Institute of Metallurgy and Materials Science ; ISSN 1733-3490 . — 2006 — vol. 51 iss. 1 spec. iss., s. 83–86. — Bibliogr. s. 86. — MicroCEM : workshop on “Progress in Microstructure Characterization by Electron Microscopy” : 30 September – 2 October 2005, Zakopane, Poland / eds.: Ewa Bełtowska, Marek Faryna, Krzysztof Sztwiertnia ; Polish Academy of Sciences. Committee of Metallurgy. Institute of Metallurgy and Materials Science. Kraków, Poland. — Warszawa, Kraków : PAS, 2006
Autorzy (5)
- AGHChmielowski Radosław
- Madigou Veronique
- Fremy M. A.
- AGHBlicharski Marek
- Nihoul G.
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 27660 |
|---|---|
| Data dodania do BaDAP | 2006-06-05 |
| Rok publikacji | 2006 |
| Typ publikacji | referat w czasopiśmie |
| Otwarty dostęp | |
| Czasopismo/seria | Archives of Metallurgy and Materials |
Abstract
The series of conductive oxides, Srn+1RunO3n+1, has been studied for applications in microelectronics as these oxides could be interesting electrode materials for ferroelectric memories (FeRAM). Sr2RuO4 seems to be an interesting candidate. Thin films of Sr2RuO4 were obtained by pulsed laser deposition on a Si (001) substrate. The influence of deposition times and pulse frequencies on the microstructure and properties of the deposited thin films was analysed. Thin films characterization was done by X-ray diffraction, EDS microanalysis, scanning electron microscopy, high-resolution transmission electron microscopy and conductivity measurements. Most of the films are composed of several oxides of the Srn+1RunO3n+1 series. However, their surface is well-defined and, for some films, the conductivity is interesting for applications. Deposition parameters have strong influence on composition and microstructure of oxides films.