Szczegóły publikacji

Opis bibliograficzny

High-purity copper structures from a perfluorinated copper carboxylate using focused electron beam induced deposition and post-purification / Luisa Berger, Jakub JURCZYK, Katarzyna Madajska, Thomas Edward James Edwards, Iwona Szymańska, Patrik Hoffmann, Ivo Utke // ACS Applied Electronic Materials [Dokument elektroniczny]. — Czasopismo elektroniczne ; ISSN 2637-6113. — 2020 — vol. 2 iss. 7, s. 1989-1996. — Wymagania systemowe: Adobe Reader. — Tryb dostępu: https://pubs-1acs-1org-137rjw9i8008d.wbg2.bg.agh.edu.pl/doi/p... [2020-09-23]. — Bibliogr. s. 1994-1996, Abstr. — Publikacja dostępna online od: 2020-06-12. — J. Jurczyk - dod. afiliacja: Laboratory for Mechanics of Materials and Nanostructures, Empa Swiss Federal Laboratories for Materials Science and Technology, Switzerland

Autorzy (7)

  • Berger Luisa
  • AGHJurczyk Jakub
  • Madajska Katarzyna
  • Edwards Thomas
  • Szymańska Iwona B.
  • Hoffmann Patrik
  • Utke Ivo

Słowa kluczowe

focused electron beam induced depositionCu-2(pfp)(4)copper(II) pentafluoropropionatecopperpurificationlow volatility precursorcarboxylate

Dane bibliometryczne

ID BaDAP130169
Data dodania do BaDAP2020-09-23
DOI10.1021/acsaelm.0c00282
Rok publikacji2020
Typ publikacjiartykuł w czasopiśmie
Otwarty dostęptak
Czasopismo/seriaACS Applied Electronic Materials

Abstract

The electron-induced modification of volatile physisorbed metal-organic molecules is the key process in focused electron beam induced deposition (FEBID). In this work, the perfluorinated copper carboxylate [Cu-2(mu-O2CC2F5)(4)], (Cu-2(pfp)(4)), was implemented in FEBID, as it has the highest metal-to-carbon ratio Cu/C = 1:6 compared to other Cu precursors used so far. FEBID was obtained within a small temperature window of 120-130 degrees C. Transmission electron microscopy verified the presence of metal(oxide) nanocrystals within a carbonaceous matrix. The chemical composition analysis revealed the loss of about 80% of ligand material during the electron-induced dissociation. The copper nanocrystals oxidized within a few minutes in films <80 nm upon exposure to ambient conditions, while they were protected by a carbon-fluorine-containing matrix in thicker areas of the deposits. A two-step post-growth annealing procedure with subsequent oxidizing and reducing atmosphere was used to purify the deposits. Pure copper crystals were formed in this step.

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