Szczegóły publikacji
Opis bibliograficzny
Refined calibration model for improving the orientation precision of electron backscatter diffraction maps / Aimo WINKELMANN, Gert Nolze, Grzegorz CIOS, Tomasz TOKARSKI, Piotr BAŁA // Materials [Dokument elektroniczny]. — Czasopismo elektroniczne ; ISSN 1996-1944. — 2020 — vol. 13 iss. 12 art. no. 2816, s. 1–20. — Wymagania systemowe: Adobe Reader. — Bibliogr. s. 17–20, Abstr. — Publikacja dostępna online od: 2020-06-23. — A. Winkelmann – dod. afiliacja: University of Strathclyde, Glasgow. — P. Bała – dod. afiliacja: ACMiN
Autorzy (5)
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 129185 |
|---|---|
| Data dodania do BaDAP | 2020-06-29 |
| Tekst źródłowy | URL |
| DOI | 10.3390/ma13122816 |
| Rok publikacji | 2020 |
| Typ publikacji | artykuł w czasopiśmie |
| Otwarty dostęp |  |
| Creative Commons | |
| Czasopismo/seria | Materials |
Abstract
For the precise determination of orientations in polycrystalline materials, electron backscatter diffraction (EBSD) requires a consistent calibration of the diffraction geometry in the scanning electron microscope (SEM). In the present paper, the variation of the projection center for the Kikuchi diffraction patterns which are measured by EBSD is calibrated using a projective transformation model for the SEM beam scan positions on the sample. Based on a full pattern matching approach between simulated and experimental Kikuchi patterns, individual projection center estimates are determined on a subgrid of the EBSD map, from which least-square fits to affine and projective transformations can be obtained. Reference measurements on single-crystalline silicon are used to quantify the orientation errors which result from different calibration models for the variation of the projection center.
