Szczegóły publikacji
Opis bibliograficzny
Amorphous hydrogenated silicon-carbon as new antireflective coating for solar cells / Tomasz STAPIŃSKI, Barbara SWATOWSKA // Journal of Non-Crystalline Solids ; ISSN 0022-3093. — 2006 — vol. 352 iss. 9–20, s. 1406–1409. — Bibliogr. s. 1409, Abstr. — Publikacja dostępna online od: 2006-03-29. — 21st International Conference on Amorphous and Nanocrystalline Semiconductors : Lisbon, Portugal, September 04-09, 2005
Autorzy (2)
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 28580 |
|---|---|
| Data dodania do BaDAP | 2006-07-20 |
| Tekst źródłowy | URL |
| DOI | 10.1016/j.jnoncrysol.2005.12.041 |
| Rok publikacji | 2006 |
| Typ publikacji | referat w czasopiśmie |
| Otwarty dostęp |  |
| Czasopismo/seria | Journal of Non-Crystalline Solids |
Abstract
The authors used plasma enhanced chemical vapor deposition (RF) in SiH4 + CH2 to deposit hydrogenated amorphous silicon-carbon (a-Si:C:H) films. The process parameters were chosen to obtain films of optimal energy gap, refractive index (depended on carbon content) and thickness suitable for optoelectronic applications. The correlation between thin film morphology, structure and process parameters was found. The films were chemically inert and wear resistive. For some process parameters it was possible to obtain films of low reflectivity, smooth, hydrogen rich and homogeneous. Multicrystalline silicon solar cells with a-Si:C:H coating on a front surface exhibit apparent increase in efficiency. a-Si:C:H thin films seems to be good candidates for antireflective coatings (ARC) in solar cells. (c) 2006 Elsevier B.V. All rights reserved.
