Szczegóły publikacji
Opis bibliograficzny
Thermal stability of the tetragonal $\beta$-phase in Ta thin films deposited by electron-beam evaporation / Renata А. Kozhukhovska, Sergiy І. Bogatyrenko, Aleksandr P. KRYSHTAL // Vacuum : Surface Engineering, Surface Instrumentation & Vacuum Technology ; ISSN 0042-207X . — 2026 — vol. 248 art. no. 115217, s. 1–8. — Bibliogr. s. 7–8, Abstr. — Publikacja dostępna online od: 2026-02-25
Autorzy (3)
- Kozhukhovska Renata A.
- Bogatyrenko Sergey I.
- AGHKryshtal Oleksandr
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 166504 |
|---|---|
| Data dodania do BaDAP | 2026-03-20 |
| Tekst źródłowy | URL |
| DOI | 10.1016/j.vacuum.2026.115217 |
| Rok publikacji | 2026 |
| Typ publikacji | artykuł w czasopiśmie |
| Otwarty dostęp |  |
| Czasopismo/seria | Vacuum |
Abstract
We studied the formation and thermal stability of the β-phase in tantalum films with thicknesses ranging from 12.5 to 160 nm, deposited by low-energy (∼kT) methods at substrate temperatures between 10 and 300 °C. Electron diffraction, high-resolution (S)TEM imaging, and XRD were used for in situ and ex situ characterization of the morphology, composition, and structure of tantalum films in a temperature range 10-1100 °C. We demonstrated the formation of single-phase β-Ta films deposited by electron-beam evaporation onto room-temperature substrates, independent of film thickness. Our results show that the β phase exhibits higher thermal stability in thin tantalum films than in thick films. It was established that substrate temperature exerts a significant influence on both the phase composition and the morphological structure of the condensed tantalum films. This result is highly relevant for thin-film technologies, as metastable β-W-type structures in refractory metals can be readily achieved by controlling the surface mobility of adatoms during deposition.
