Szczegóły publikacji
Opis bibliograficzny
Formation of silicide layers on a $Ti-46Al-8Ta$ alloy in pack cementation and diffusion couple experiments / K. RUBACHA, E. GODLEWSKA, K. ZAWADZKA, J. DĄBROWA // Surface and Coatings Technology ; ISSN 0257-8972. — 2022 — vol. 429 art. 127860, s. 1–11. — Bibliogr. s. 11, Abstr. — Publikacja dostępna online od: 2021-10-30
Autorzy (4)
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 140058 |
|---|---|
| Data dodania do BaDAP | 2022-05-06 |
| Tekst źródłowy | URL |
| DOI | 10.1016/j.surfcoat.2021.127860 |
| Rok publikacji | 2022 |
| Typ publikacji | artykuł w czasopiśmie |
| Otwarty dostęp |  |
| Czasopismo/seria | Surface & Coatings Technology |
Abstract
This work compares silicide layers grown on Ti-46Al-8Ta (at.%) substrates in pack cementation and in diffusion couple experiments at elevated temperatures. Based on preliminary experiments showing Kirkendall porosity at the coating/substrate interface, a micrometric Ti-10%Si interlayer was deposited by magnetron sputtering prior to siliconizing treatments to prevent excessive Ti diffusion from the substrate. In both types of experiments, the diffusion zone was multi-layered and consisted of Ti/Ta silicides in the outer part and Ti/Ta aluminides in the inner part next to the interface with the alloy. Significant differences were found in the overall thickness and thicknesses of the individual layers. Kinetics of layer growth was followed by thickness measurements. Although inward diffusion of silicon was the dominant mechanism of coating formation, other concurrent processes evidently contributed to the development of the characteristic microstructural features and to the observed differences in thickness.
