Szczegóły publikacji
Opis bibliograficzny
Optimization of condition for cold plasma deposition of thin layers for surface modification of working electrodes / J. LIPIŃKSA, M. Madej, B. BAŚ, J. Tyczkowski // W: Proceedings of the 16th international students conference Modern Analytical Chemistry : Prague, SEP 17-18, 2020 / ed. K. Nesmerak. — [Prague : Charles University], [2020]. — ISBN: 978-80-7444-079-3. — S. 129–134. — Bibliogr., Abstr.
Autorzy (4)
- AGHLipińska Justyna
- Madej Maria
- AGHBaś Bogusław
- Tyczkowski Jacek
Słowa kluczowe
Dane bibliometryczne
| ID BaDAP | 133286 |
|---|---|
| Data dodania do BaDAP | 2021-04-07 |
| Tekst źródłowy | URL |
| Rok publikacji | 2020 |
| Typ publikacji | materiały konferencyjne (aut.) |
| Otwarty dostęp |  |
Abstract
Currently, research is focused on the search for new, physically and chemically stable materials as well as volume or surface modification. One of the methods used for surface modification is the application of thin layers from inorganic and organic compounds. The plasma enhanced chemical vapor deposition is a method that allows material modification and also deposition of thin layers. This work concerns optimization of cold plasma deposition parameters and to achieve the best electrical conductivity while maintaining the high mechanical strength of the formed layers. Preliminary tests were focused on optimizing the layering parameters such as the deposition time, discharge power, pressure of monomer and the flow of argon. The obtained samples were subjected to thermal treatment after which they were covered with a layer of aluminum. The thickness of the obtained layers was determined on the basis of interference microscopy measurements. As a result of the experiments, layers with a thickness of 20 nm to 600 nm were obtained. The conductivity of the deposited layers was also determined and values from 0.03 to 150 S m(-1) were obtained.
