AFMsputtering

Opis zakresu działań	The aim of this project is to extend research on AFM systems by studying AFM layers prepared using the ion sputtering method. Ion sputtering involves the release of atoms/molecules from the target material as a result of bombardment by an ion beam with suitable energy. The sputtered material condenses on the substrate, forming a thin-film coating. Comparative studies of AFM layers produced using MBE methods and ion sputtering will help determine the impact of preparation techniques on the properties of the resulting systems.
Jednostka wiodąca	, undefined

Numer POB	Opis
POB 7	Design, production, and testing of modern materials and the technologies of the future based on a multidisciplinary approach combining materials engineering with chemistry, physics, mathematics, and medicine